| Effect of DC bias on the plasma properties in remote plasma atomic layer deposition and its application to HfO2 thin films H Kim, S Woo, J Lee, Y Kim, H Lee, IJ Choi, YD Kim, CW Chung, H Jeon Journal of The Electrochemical Society 158 (1), H21, 2010 | 17 | 2010 |
| A study on the maximum power transfer condition in an inductively coupled plasma using transformer circuit model YD Kim, HC Lee, CW Chung Physics of Plasmas 20 (9), 2013 | 13 | 2013 |
| Transition of electron kinetics in weakly magnetized inductively coupled plasmas JY Kim, HC Lee, YD Kim, YC Kim, CW Chung Physics of Plasmas 20 (10), 2013 | 10 | 2013 |
| Spatial measurements of electron energy distribution and plasma parameters in a weakly magnetized inductive discharge YD Kim, YK Lee, HC Lee, CW Chung Physics of Plasmas 20 (2), 2013 | 8 | 2013 |
| Characteristics of probe current harmonics based on various applied voltage waveforms in low temperature plasmas YD Kim, YS Kim, HC Lee, JY Bang, CW Chung Physics of Plasmas 18 (3), 2011 | 6 | 2011 |
| A new design of wireless power transfer system using hellical resonators applicapable to multi-channel power transmission YD Kim, HJ Lee, JY Bang, CW Chung 2014 IEEE Wireless Power Transfer Conference, 277-279, 2014 | 5 | 2014 |
| Investigation of plasma diagnostics using a dual frequency harmonic technique DH Kim, YD Kim, SW Cho, YS Kim, CW Chung Journal of Applied Physics 116 (9), 2014 | 4 | 2014 |
| Cleaning solution production systems and methods, and plasma reaction tanks BJ Yoo, MH Kim, SK Nam, WH Jang, KH Han, YD Kim, JM Bang US Patent 11,107,705, 2021 | 3 | 2021 |
| Plasma generator, plasma processing device, and method of manufacturing semiconductor device using the plasma processing device SOYKKSKNELS Ha US Patent US20230117953A1, 2023 | 1 | 2023 |
| Plasma control device and plasma processing system SOYKKSKKTE LeeSunghun JANG US Patent 20,230,091,161, 2023 | 1* | 2023 |
| Method of cleaning collector of euv light source system JPI Changsoon LIM, Youngdo KIM, Daewon KANG, Chansoo KANG, Hoonseop KIM ... US Patent 20,230,308,339, 2022 | 1* | 2022 |
| Device for radical diagnostic in plasma processing chamber, radical diagnostic system having the same, and operating method thereof SLKKKSKNS Lee US Patent 20,230,197,423, 2023 | | 2023 |
| Apparatus for arcing diagnosis, plasma process equipment including the same, and arcing diagnosis method CLKKKKSNLS JangJonghun PI US Patent 20230109672A1, 2023 | | 2023 |
| Device for measuring density of plasma, plasma processing system, and semiconductor device manufacturing method using the same VVPGPKKKN OhChangsoon LIM US Patent 20,230,102,201, 2023 | | 2023 |
| Plasma etching apparatus and semiconductor processing system DSYKKKJYOS Jang US Patent 20,230,078,095, 2023 | | 2023 |
| System of semiconductor process and control method thereof KIM Youngdo, LIM Sungyong, K Daewon, KIM Sungyeol, NAM Sangki, ... US Patent 20,230,005,723, 2023 | | 2023 |
| RF sensing apparatus of plasma processing chamber and plasma processing chamber including same KHH Young Do Kim, Sung Yong Lim, Chan Soo Kang, Do Hoon Kwon, Min Ju Kim ... US Patent 10,901,007, 2021 | | 2021 |
| Pulsed plasma analyzer and method for analyzing the same V Volynets, P Vladimir, Y Do Kim, Y Barsukov, SH Lee, SH Jang US Patent 10,249,485, 2019 | | 2019 |
