Takip et
Fred Roozeboom
Fred Roozeboom
Diğer adlarFreddy Roozeboom, F. Roozeboom
utwente.nl üzerinde doğrulanmış e-posta adresine sahip
Alıntı yapanlar
Alıntı yapanlar
Vanadium oxide monolayer catalysts. 3. A Raman spectroscopic and temperature-programmed reduction study of monolayer and crystal-type vanadia on various supports
F Roozeboom, MC Mittelmeijer-Hazeleger, JA Moulijn, J Medema, ...
The Journal of Physical Chemistry 84 (21), 2783-2791, 1980
Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition
P Poodt, DC Cameron, E Dickey, SM George, V Kuznetsov, GN Parsons, ...
Journal of Vacuum Science & Technology A 30 (1), 2012
3‐D integrated all‐solid‐state rechargeable batteries
PHL Notten, F Roozeboom, RAH Niessen, L Baggetto
Advanced Materials 19 (24), 4564-4567, 2007
Energetics of self-interstitial clusters in Si
NEB Cowern, G Mannino, PA Stolk, F Roozeboom, HGA Huizing, ...
Physical Review Letters 82 (22), 4460, 1999
High energy density all‐solid‐state batteries: a challenging concept towards 3D integration
L Baggetto, RAH Niessen, F Roozeboom, PHL Notten
Advanced Functional Materials 18 (7), 1057-1066, 2008
High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation
P Poodt, A Lankhorst, F Roozeboom, K Spee, D Maas, A Vermeer
Adv. Mater 22 (32), 3564-3567, 2010
Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor
JL Van Hemmen, SBS Heil, JH Klootwijk, F Roozeboom, CJ Hodson, ...
Journal of The Electrochemical Society 154 (7), G165, 2007
Rapid thermal processing: science and technology
RB Fair
Academic Press, 2012
Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor
SBS Heil, JL Van Hemmen, CJ Hodson, N Singh, JH Klootwijk, ...
Journal of Vacuum Science & Technology A 25 (5), 1357-1366, 2007
Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
A Mameli, MJM Merkx, B Karasulu, F Roozeboom, WEMM Kessels, ...
ACS nano 11 (9), 9303-9311, 2017
Ultrahigh capacitance density for multiple ALD-grown MIM capacitor stacks in 3-D silicon
JH Klootwijk, KB Jinesh, W Dekkers, JF Verhoeven, FC Van Den Heuvel, ...
IEEE Electron Device Letters 29 (7), 740-742, 2008
Atomic layer etching: What can we learn from atomic layer deposition?
T Faraz, F Roozeboom, HCM Knoops, WMM Kessels
ECS Journal of Solid State Science and Technology 4 (6), N5023, 2015
Rapid thermal processing systems: A review with emphasis on temperature control
F Roozeboom, N Parekh
Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1990
Vanadium oxide monolayer catalysts. I. Preparation, characterization, and thermal stability
F Roozeboom, T Fransen, P Mars, PJ Gellings
Zeitschrift für anorganische und allgemeine Chemie 449 (1), 25-40, 1979
Vanadium oxide monolayer catalysts: the vapor-phase oxidation of methanol
F Roozeboom, PD Cordingley, PJ Gellings
Journal of Catalysis 68 (2), 464-472, 1981
Low-temperature deposition of TiN by plasma-assisted atomic layer deposition
SBS Heil, E Langereis, F Roozeboom, MCM Van De Sanden, ...
Journal of the Electrochemical Society 153 (11), G956, 2006
Ferromagnetic resonance and eddy currents in high-permeable thin films
E Van de Riet, F Roozeboom
Journal of applied physics 81 (1), 350-354, 1997
Spatial atomic layer deposition of zinc oxide thin films
A Illiberi, F Roozeboom, P Poodt
ACS applied materials & interfaces 4 (1), 268-272, 2012
Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications
HCM Knoops, L Baggetto, E Langereis, MCM Van De Sanden, ...
Journal of the Electrochemical Society 155 (12), G287, 2008
Thermally assisted reversal of exchange biasing in NiO and FeMn based systems
PAA Van der Heijden, T Maas, WJM De Jonge, JCS Kools, F Roozeboom, ...
Applied physics letters 72 (4), 492-494, 1998
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Makaleler 1–20