| Atomic layer deposition of platinum thin films T Aaltonen, M Ritala, T Sajavaara, J Keinonen, M Leskelä Chemistry of materials 15 (9), 1924-1928, 2003 | 523 | 2003 |
| Ruthenium thin films grown by atomic layer deposition T Aaltonen, P Alén, M Ritala, M Leskelä Chemical Vapor Deposition 9 (1), 45-49, 2003 | 386 | 2003 |
| Electrochemical/Chemical Deposition and Etching-Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum T Aaltonen, A Rahtu, M Ritala, M Leskela Electrochemical and Solid State Letters 6 (9), C130, 2003 | 301 | 2003 |
| Process for producing metal thin films by ALD T Aaltonen, P Alén, M Ritala, M Leskelä US Patent 6,824,816, 2004 | 223 | 2004 |
| Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature T Aaltonen, M Ritala, YL Tung, Y Chi, K Arstila, K Meinander, M Leskelä Journal of materials research 19 (11), 3353-3358, 2004 | 213 | 2004 |
| Atomic layer deposition of iridium thin films T Aaltonen, M Ritala, V Sammelselg, M Leskelä Journal of The Electrochemical Society 151 (8), G489-G492, 2004 | 205 | 2004 |
| Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)3 and Oxygen T Aaltonen, M Ritala, K Arstila, J Keinonen, M Leskelä Chemical Vapor Deposition 10 (4), 215-219, 2004 | 194 | 2004 |
| Erratum: Electrodeposition of Cu on Ru Barrier Layers for Damascene Processing [J. Electrochem. Soc., 153, C37 (2005)] TP Moffat, M Walker, PJ Chen, JE Bonevich, WF Egelhoff, L Richter, C Witt, ... Journal of The Electrochemical Society 153 (3), L5-L5, 2006 | 163* | 2006 |
| Electrodeposition of Cu on Ru barrier layers for damascene processing TP Moffat, M Walker, PJ Chen, JE Bonevich, WF Egelhoff, L Richter, C Witt, ... Journal of the Electrochemical Society 153 (1), C37-C50, 2006 | 163 | 2006 |
| Glass-encapsulated light harvesters: More efficient dye-sensitized solar cells by deposition of self-aligned, conformal, and self-limited silica layers HJ Son, X Wang, C Prasittichai, NC Jeong, T Aaltonen, RG Gordon, ... Journal of the American Chemical Society 134 (23), 9537-9540, 2012 | 122 | 2012 |
| Lanthanum titanate and lithium lanthanum titanate thin films grown by atomic layer deposition T Aaltonen, M Alnes, O Nilsen, L Costelle, H Fjellvåg Journal of Materials Chemistry 20 (14), 2877-2881, 2010 | 122 | 2010 |
| Atomic Layer Deposition of Li2O–Al2O3 Thin Films T Aaltonen, O Nilsen, A Magrasó, H Fjellvåg Chemistry of materials 23 (21), 4669-4675, 2011 | 113 | 2011 |
| Atomic layer deposition of lithium containing thin films M Putkonen, T Aaltonen, M Alnes, T Sajavaara, O Nilsen, H Fjellvåg Journal of Materials Chemistry 19 (46), 8767-8771, 2009 | 112 | 2009 |
| ALD of rhodium thin films from Rh (acac) 3 and oxygen T Aaltonen, M Ritala, M Leskelä Electrochemical and Solid-State Letters 8 (8), C99-C101, 2005 | 96 | 2005 |
| Iridium barriers for direct copper electrodeposition in damascene processing D Josell, J Bonevich, T Moffat, T Aaltonen, M Ritala, M Leskelä ECS Transactions 1 (10), 57-61, 2006 | 76 | 2006 |
| Process for producing metal thin films by ALD T Aaltonen, P Alén, M Ritala, M Leskelä US Patent 7,220,451, 2007 | 63 | 2007 |
| Atomic layer deposition of SrS and BaS thin films using cyclopentadienyl precursors J Ihanus, T Hänninen, T Hatanpää, T Aaltonen, I Mutikainen, T Sajavaara, ... Chemistry of materials 14 (5), 1937-1944, 2002 | 60 | 2002 |
| Atomic layer deposition of noble metal thin films T Aaltonen Helsingin yliopisto, 2005 | 36 | 2005 |
| Atomic layer deposition and characterization of HfO2 films on noble metal film substrates K Kukli, T Aaltonen, J Aarik, J Lu, M Ritala, S Ferrari, A Hårsta, M Leskelä Journal of the Electrochemical Society 152 (7), F75-F82, 2005 | 30 | 2005 |
| Atomic layer deposition rate, phase composition and performance of HfO {sub 2} films on noble metal and alkoxylated silicon substrates K Kukli, M Ritala, T Pilvi, T Aaltonen, J Aarik, M Lautala, M Leskelae | 30 | 2005 |
