Atomic layer deposition of noble metals and their oxides J Hämäläinen, M Ritala, M Leskelä Chemistry of Materials 26 (1), 786-801, 2014 | 407 | 2014 |
Atomic layer deposition of noble metal oxides J Hamalainen, M Ritala, M Leskela US Patent App. 11/182,734, 2007 | 348 | 2007 |
Atomic layer deposition of rhenium containing thin films J Hamalainen, M Ritala, M Leskela US Patent 10,619,242, 2020 | 266 | 2020 |
Atomic Layer Deposition of Platinum Oxide and Metallic Platinum Thin Films from Pt(acac)2 and Ozone J Hämäläinen, F Munnik, M Ritala, M Leskela Chemistry of Materials 20 (21), 6840-6846, 2008 | 121 | 2008 |
Lithium phosphate thin films grown by atomic layer deposition J Hämäläinen, J Holopainen, F Munnik, T Hatanpää, M Heikkilä, M Ritala, ... Journal of The Electrochemical Society 159 (3), A259, 2012 | 110 | 2012 |
Atomic Layer Deposition of Iridium Oxide Thin Films from Ir(acac)3 and Ozone J Hämäläinen, M Kemell, F Munnik, U Kreissig, M Ritala, M Leskelä Chemistry of Materials 20 (9), 2903-2907, 2008 | 76 | 2008 |
Atomic layer deposition of rhenium disulfide J Hämäläinen, M Mattinen, K Mizohata, K Meinander, M Vehkamäki, ... Advanced Materials 30 (24), 1703622, 2018 | 72 | 2018 |
Atomic layer deposition of iridium thin films by consecutive oxidation and reduction steps J Hamalainen, E Puukilainen, M Kemell, L Costelle, M Ritala, M Leskelä Chemistry of Materials 21 (20), 4868-4872, 2009 | 72 | 2009 |
Low-temperature atomic layer deposition of cobalt oxide as an effective catalyst for photoelectrochemical water-splitting devices J Kim, T Iivonen, J Hamalainen, M Kemell, K Meinander, K Mizohata, ... Chemistry of Materials 29 (14), 5796-5805, 2017 | 60 | 2017 |
Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures J Hämäläinen, T Hatanpää, E Puukilainen, T Sajavaara, M Ritala, ... Journal of Materials Chemistry 21 (41), 16488-16493, 2011 | 58 | 2011 |
Comparison of static and dynamic 18F-FDG PET/CT for quantification of pulmonary inflammation in acute lung injury A Braune, F Hofheinz, T Bluth, T Kiss, J Wittenstein, M Scharffenberg, ... Journal of Nuclear Medicine 60 (11), 1629-1634, 2019 | 57* | 2019 |
Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactants J Hämäläinen, E Puukilainen, T Sajavaara, M Ritala, M Leskelä Thin Solid Films 531, 243-250, 2013 | 53 | 2013 |
Study of amorphous lithium silicate thin films grown by atomic layer deposition J Hämäläinen, F Munnik, T Hatanpää, J Holopainen, M Ritala, M Leskelä Journal of Vacuum Science & Technology A 30 (1), 2012 | 52 | 2012 |
Atomic layer deposition of osmium J Hämäläinen, T Sajavaara, E Puukilainen, M Ritala, M Leskelä Chemistry of Materials 24 (1), 55-60, 2012 | 49 | 2012 |
Atomic Layer Deposition of LiF Thin Films from Lithd and TiF4 Precursors M Mäntymäki, J Hämäläinen, E Puukilainen, F Munnik, M Ritala, ... Chemical Vapor Deposition 19 (4‐6), 111-116, 2013 | 48 | 2013 |
Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)2, and TiF4 Precursors M Mäntymäki, J Hämäläinen, E Puukilainen, T Sajavaara, ... Chemistry of Materials 25 (9), 1656-1663, 2013 | 47 | 2013 |
(MeCp) Ir (CHD) and molecular oxygen as precursors in atomic layer deposition of iridium J Hämäläinen, T Hatanpää, E Puukilainen, L Costelle, T Pilvi, M Ritala, ... Journal of Materials Chemistry 20 (36), 7669-7675, 2010 | 44 | 2010 |
Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check WA Lanford, M Parenti, BJ Nordell, MM Paquette, AN Caruso, ... Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2016 | 42 | 2016 |
Atomic layer deposition of aluminum and titanium phosphates J Hämäläinen, J Holopainen, F Munnik, M Heikkilä, M Ritala, ... The Journal of Physical Chemistry C 116 (9), 5920-5925, 2012 | 40 | 2012 |
Nucleation and conformality of iridium and iridium oxide thin films grown by atomic layer deposition M Mattinen, J Hamalainen, F Gao, P Jalkanen, K Mizohata, J Raisanen, ... Langmuir 32 (41), 10559-10569, 2016 | 39 | 2016 |