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Co-authors
Peidong YangUCBVerified email at berkeley.edu
Marcus WorsleyLawrence Livermore National LaboratoryVerified email at llnl.gov
Paden RoderPTD Lithography Engineer, Intel Corporation; Hillsboro, ORVerified email at grinnell.edu
Matthew J CraneUniversity of WashingtonVerified email at uw.edu
Ming C. WuProfessor of Electrical Engineering and Computer Sciences, University of California, BerkeleyVerified email at eecs.berkeley.edu
Josh GoldbergerThe Ohio State UniversityVerified email at chemistry.ohio-state.edu
Matthew LimSandia National LaboratoriesVerified email at sandia.gov
Richard J. SAYKALLYProfessor of Chemistry, UC BerkeleyVerified email at berkeley.edu
Jan LiphardtAssociate Professor of BioengineeringVerified email at stanford.edu
Aleksandra RadenovicAssociate Professor, EPFLVerified email at epfl.ch
P. James SchuckColumbia UniversityVerified email at columbia.edu
Heon-Jin ChoiDepartment of Materials Science and Engineering, Yonsei UniversityVerified email at yonsei.ac.kr
Sergei KucheyevPhysicist, Lawrence Livermore National Laboratory Verified email at llnl.gov
Trevor WilleyLawrence Livermore National LaboratoryVerified email at llnl.gov
Joseph ZaugLawrence Livermore National LaboratoryVerified email at llnl.gov
Hari ShroffChief, Laboratory of High Resolution Optical ImagingVerified email at nih.gov
Pei-Yu ChiouUniversity of California at Los AngelesVerified email at seas.ucla.edu
Rhonda StroudUS Naval Research Laboratory, Washington, DCVerified email at nrl.navy.mil
Eric StachProfessor, Department of Materials Science and Engineering, University of PennsylvaniaVerified email at seas.upenn.edu
François Lagugné-LabarthetProfessor of Chemistry, Western University, CanadaVerified email at uwo.ca
Peter J. Pauzauskie
University of Washington, Materials Science & Engineering
Verified email at uw.edu - Homepage