| Thermal probe maskless lithography for 27.5 nm half-pitch Si technology LL Cheong, P Paul, F Holzner, M Despont, DJ Coady, JL Hedrick, R Allen, ... Nano letters 13 (9), 4485-4491, 2013 | 98 | 2013 |
| Neon ion beam lithography (NIBL) D Winston, VR Manfrinato, SM Nicaise, LL Cheong, H Duan, D Ferranti, ... Nano letters 11 (10), 4343-4347, 2011 | 92 | 2011 |
| Sub-5 keV electron-beam lithography in hydrogen silsesquioxane resist VR Manfrinato, LL Cheong, H Duan, D Winston, HI Smith, KK Berggren Microelectronic Engineering 88 (10), 3070-3074, 2011 | 38 | 2011 |
| Identification of hot spots or defects by machine learning J Su, Y Zou, C Lin, S Hunsche, M Jochemsen, YW Lu, LL Cheong US Patent 11,443,083, 2022 | 26 | 2022 |
| Three-dimensional photonic crystals by large-area membrane stacking L Lu, LL Cheong, HI Smith, SG Johnson, JD Joannopoulos, M Soljačić Optics letters 37 (22), 4726-4728, 2012 | 24 | 2012 |
| Thermal probe nanolithography: in-situ inspection, high-speed, high-resolution, 3D F Holzner, P Paul, M Despont, LL Cheong, J Hedrick, U Dürig, A Knoll 29th European Mask and Lithography Conference 8886, 26-34, 2013 | 19 | 2013 |
| EUV processing and characterization for BEOL N Saulnier, Y Xu, W Wang, L Sun, LL Cheong, R Lallement, G Beique, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 234-245, 2015 | 18 | 2015 |
| Failure detection and classsification using sensor data and/or measurement data T Honda, LL Cheong, L Kuravi US Patent 11,029,359, 2021 | 14 | 2021 |
| Single view physical distance estimation using human pose X Fei, H Wang, LL Cheong, X Zeng, M Wang, J Tighe Proceedings of the IEEE/CVF International Conference on Computer Vision …, 2021 | 10 | 2021 |
| 3D nanostructures by stacking pre-patterned fluid-supported single-crystal Si membranes S Ghadarghadr, CP Fucetola, L Lee Cheong, E E Moon, H I Smith Journal of Vacuum Science & Technology B 29 (6), 2011 | 9 | 2011 |
| Closed-loop high-speed 3D thermal probe nanolithography AW Knoll, M Zientek, LL Cheong, C Rawlings, P Paul, F Holzner, ... Alternative Lithographic Technologies VI 9049, 47-54, 2014 | 8 | 2014 |
| Membrane-integrated superconducting nanowire singlephoton detectors F Najafi, J Mower, X Hu, F Bellei, P Kharel, A Dane, Y Ivry, L Cheong, ... CLEO: 2013, 1-2, 2013 | 7 | 2013 |
| Maintenance scheduling for semiconductor manufacturing equipment T Honda, JD David, LL Cheong US Patent 11,295,993, 2022 | 6 | 2022 |
| EUV mask cleans comparison of frontside and dual-sided concurrent cleaning LL Cheong, LM Kindt, C Turley, D Leonhard, JM Boyle, CF Robinson, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 521-530, 2015 | 6 | 2015 |
| Selective inclusion/exclusion of semiconductor chips in accelerated failure tests LL Cheong, T Honda, RD Kekatpure, L Kuravi, JD David US Patent 10,777,470, 2020 | 5 | 2020 |
| Methods for determining an approximate value of a processing parameter at which a characteristic of the patterning process has a target value LL Cheong, W Huang, B La Fontaine US Patent 11,126,092, 2021 | 4 | 2021 |
| Prediction of defensive player trajectories in NFL games with defender CNN-LSTM Model LL Cheong, X Zeng, A Tyagi | 4 | 2021 |
| Exploring EUV mask backside defectivity and control methods C Turley, J Rankin, L Kindt, M Lawliss, L Bolton, K Collins, L Cheong, ... Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015 | 4 | 2015 |
| Reduction of Critical Dimension Difference in Litho-Etch-Litho-Etch Double Patterning Process H Tang, JC Shearer, LL Cheong, NA Saulnier, SA Sieg, K Petrillo, A Metz, ... Journal of Photopolymer Science and Technology 28 (1), 13-16, 2015 | 3 | 2015 |
| Benchmarking framework for anomaly localization: Towards real-world deployment of automated visual inspection T Gangopadhyay, S Hong, S Roy, Y Shah, LL Cheong Journal of Manufacturing Systems 69, 64-75, 2023 | 2 | 2023 |
Karl K. BerggrenProfessor of Electrical Engineering, MITVerified email at mit.edu
