Marc Zelsmann
Marc Zelsmann
CNRS, Laboratoire des Technologies de la Microélectronique, Grenoble, France
cea.fr üzerinde doğrulanmış e-posta adresine sahip
Başlık
Alıntı yapanlar
Alıntı yapanlar
Yıl
Seventy-fold enhancement of light extraction from a defectless photonic crystal made on silicon-on-insulator
M Zelsmann, E Picard, T Charvolin, E Hadji, M Heitzmann, B Dal’Zotto, ...
Applied physics letters 83 (13), 2542-2544, 2003
1392003
Fabrication of High‐Density, Large‐Area Conducting‐Polymer Nanostructures
B Dong, N Lu, M Zelsmann, N Kehagias, H Fuchs, CM Sotomayor Torres, ...
Advanced Functional Materials 16 (15), 1937-1942, 2006
872006
Reverse-contact UV nanoimprint lithography for multilayered structure fabrication
N Kehagias, V Reboud, G Chansin, M Zelsmann, C Jeppesen, C Schuster, ...
Nanotechnology 18 (17), 175303, 2007
622007
Improved release strategy for UV nanoimprint lithography
S Garidel, M Zelsmann, N Chaix, P Voisin, J Boussey, A Beaurain, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
572007
Two-dimensional polymer photonic crystal band-edge lasers fabricated by nanoimprint lithography
V Reboud, P Lovera, N Kehagias, M Zelsmann, C Schuster, F Reuther, ...
Applied Physics Letters 91 (15), 151101, 2007
492007
XPS study of the degradation mechanism of fluorinated anti-sticking treatments used in UV nanoimprint lithography
D Truffier-Boutry, A Beaurain, R Galand, B Pelissier, J Boussey, ...
Microelectronic engineering 87 (2), 122-124, 2010
422010
Chemical degradation of fluorinated antisticking treatments in UV nanoimprint lithography
D Truffier-Boutry, M Zelsmann, J De Girolamo, J Boussey, C Lombard, ...
Applied Physics Letters 94 (4), 044110, 2009
422009
Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings
RA Farrell, N Kehagias, MT Shaw, V Reboud, M Zelsmann, JD Holmes, ...
ACS nano 5 (2), 1073-1085, 2011
412011
Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography stacks
C Girardot, S Böhme, S Archambault, M Salaün, E Latu-Romain, ...
ACS applied materials & interfaces 6 (18), 16276-16282, 2014
332014
Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
M Salaun, M Zelsmann, S Archambault, D Borah, N Kehagias, C Simao, ...
Journal of Materials Chemistry C 1 (22), 3544-3550, 2013
332013
Spontaneous emission control of colloidal nanocrystals using nanoimprinted photonic crystals
V Reboud, N Kehagias, CM Sotomayor Torres, M Zelsmann, M Striccoli, ...
Applied physics letters 90 (1), 011115, 2007
332007
Mold cleaning and fluorinated anti-sticking treatments in nanoimprint lithography
D Truffier-Boutry, R Galand, A Beaurain, A Francone, B Pelissier, ...
Microelectronic engineering 86 (4-6), 669-672, 2009
322009
Submicron three-dimensional structures fabricated by reverse contact UV nanoimprint lithography
N Kehagias, V Reboud, G Chansin, M Zelsmann, C Jeppesen, F Reuther, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
302006
Characterisation of ultraviolet nanoimprint dedicated resists
P Voisin, M Zelsmann, R Cluzel, E Pargon, C Gourgon, J Boussey
Microelectronic engineering 84 (5-8), 967-972, 2007
282007
Broadband optical characterization and modeling of photonic crystal waveguides for silicon optical interconnects
M Zelsmann, E Picard, T Charvolin, E Hadji, M Heitzmann, B Dal’zotto, ...
Journal of applied physics 95 (3), 1606-1608, 2004
282004
Degradation and surfactant-aided regeneration of fluorinated anti-sticking mold treatments in UV nanoimprint lithography
M Zelsmann, C Alleaume, D Truffier-Boutry, A Francone, A Beaurain, ...
Microelectronic engineering 87 (5-8), 1029-1032, 2010
272010
Photoluminescence enhancement in nanoimprinted photonic crystals and coupled surface plasmons
V Reboud, N Kehagias, M Zelsmann, C Schuster, M Fink, F Reuther, ...
Optics express 15 (12), 7190-7195, 2007
272007
Epoxy silsesquioxane resists for UV nanoimprint lithography
J De Girolamo, M Chouiki, JH Tortai, C Sourd, S Derrough, M Zelsmann, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
232008
High-resolution fused silica mold fabrication for UV-nanoimprint
P Voisin, M Zelsmann, C Gourgon, J Boussey
Microelectronic engineering 84 (5-8), 916-920, 2007
232007
Three-dimensional polymer structures fabricated by reversal ultraviolet-curing imprint lithography
N Kehagias, M Zelsmann, CMS Torres, K Pfeiffer, G Ahrens, G Gruetzner
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
232005
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Makaleler 1–20