| Supplemental multilevel interconnects by laser direct writing: Application to GaAs digital integrated circuits JG Black, SP Doran, M Rothschild, DJ Ehrlich Applied physics letters 50 (15), 1016-1018, 1987 | 50 | 1987 |
| Laser‐direct‐writing processes: Metal deposition, etching, and applications to microcircuits JG Black, DJ Ehrlich, M Rothschild, SP Doran, JHC Sedlacek Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1987 | 38 | 1987 |
| 193-nm lithography at MIT Lincoln lab M Hibbs, R Kunz, M Rothschild Solid State Technology 38 (7), 69-74, 1995 | 28 | 1995 |
| Behavior of candidate organic pellicle materials under 157-nm laser irradiation A Grenville, V Liberman, M Rothschild, JHC Sedlacek, RH French, ... Optical Microlithography XV 4691, 1644-1653, 2002 | 25 | 2002 |
| Preliminary microfluidic simulation for immersion lithography AC Wei, GF Nellis, AY Abdo, RL Engelstad, CF Chen, M Switkes, ... Optical Microlithography XVI 5040, 713-723, 2003 | 24 | 2003 |
| 157-nm pellicles: polymer design for transparency and lifetime RH French, RC Wheland, W Qiu, MF Lemon, GS Blackman, X Zhang, ... Optical Microlithography XV 4691, 576-583, 2002 | 22 | 2002 |
| Marathon testing of optical materials for 193-nm lithographic applications V Liberman, M Rothschild, JHC Sedlacek, RS Uttaro, AK Bates, ... Laser-Induced Damage in Optical Materials: 1998 3578, 2-15, 1999 | 22 | 1999 |
| Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities TM Bloomstein, V Liberman, M Rothschild, ST Palmacci, DE Hardy, ... Optical Microlithography XV 4691, 709-723, 2002 | 21 | 2002 |
| 193-nm lithography M Rothschild, AR Forte, MW Horn, RR Kunz, SC Palmateer, ... IEEE Journal of Selected Topics in Quantum Electronics 1 (3), 916-923, 1995 | 21 | 1995 |
| Optical materials for use with excimer lasers JHC Sedlacek, M Rothschild Excimer Lasers: Applications, Beam Delivery Systems, and Laser Design 1835 …, 1993 | 21 | 1993 |
| Long-term testing of optical components for 157-nm lithography V Liberman, M Rothschild, JHC Sedlacek, RS Uttaro, AK Bates, KJ Orvek Optical Microlithography XIII 4000, 488-495, 2000 | 19 | 2000 |
| Laser cleaning of optical elements in 157-nm lithography TM Bloomstein, M Rothschild, V Liberman, DE Hardy, NN Efremow Jr, ... Optical Microlithography XIII 4000, 1537-1545, 2000 | 18 | 2000 |
| Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations MH Bennett, A Grenville, SD Hector, SR Palmer, LHA Leunissen, ... Optical Microlithography XVIII 5754, 599-610, 2005 | 17 | 2005 |
| UV cleaning of contaminated 157-nm reticles TM Bloomstein, V Liberman, M Rothschild, NN Efremow Jr, DE Hardy, ... Optical Microlithography XIV 4346, 669-675, 2001 | 16 | 2001 |
| Determination of optical properties of thin films and surfaces in 157-nm lithography V Liberman, TM Bloomstein, M Rothschild Metrology, Inspection, and Process Control for Microlithography XIV 3998 …, 2000 | 16 | 2000 |
| Photolithography at wavelengths below 200 nm M Rothschild Technical Digest. Summaries of Papers Presented at the Conference on Lasers …, 1998 | 16 | 1998 |
| Photolithography at 193 nm M Rothschild, MW Horn, CL Keast, RR Kunz, V Liberman, SC Palmateer, ... Lincoln Laboratory Journal 10 (1), 1997 | 16 | 1997 |
| Projection x-ray lithography with ultrathin imaging layers and selective electroless metallization M Rothschild, JHC Sedlacek Optical Engineering 32 (10), 2437-2445, 1993 | 16 | 1993 |
| Controlled contamination of optics under 157-nm laser irradiation TM Bloomstein, V Liberman, ST Palmacci, M Rothschild Optical Microlithography XIV 4346, 685-694, 2001 | 15 | 2001 |
| Marathon evaluation of optical materials for 157-nm lithography V Liberman, M Rothschild, NN Efremow Jr, ST Palmacci, JHC Sedlacek, ... Optical Microlithography XIV 4346, 45-51, 2001 | 15 | 2001 |
