Markku Leskela
Markku Leskela
Professor of Inorganic Chemistry, University of Helsinki
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Atomic layer deposition (ALD): from precursors to thin film structures
M Leskelä, M Ritala
Thin solid films 409 (1), 138-146, 2002
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
V Miikkulainen, M Leskelä, M Ritala, RL Puurunen
Journal of Applied Physics 113 (2), 2, 2013
Atomic layer deposition chemistry: recent developments and future challenges
M Leskelä, M Ritala
Angewandte Chemie International Edition 42 (45), 5548-5554, 2003
Atomic layer deposition
M Ritala, M Leskelä
Handbook of Thin Films, 103-159, 2002
Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources
M Ritala, K Kukli, A Rahtu, PI Räisänen, M Leskelä, T Sajavaara, ...
Science 288 (5464), 319-321, 2000
Atomic layer deposition of platinum thin films
T Aaltonen, M Ritala, T Sajavaara, J Keinonen, M Leskelä
Chemistry of materials 15 (9), 1924-1928, 2003
Handbook of thin film materials
M Ritala, M Leskela
Deposition and Processing of Thin Films 1, 103, 2002
Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition
M Ritala, M Leskelä, JP Dekker, C Mutsaers, PJ Soininen, J Skarp
Chemical Vapor Deposition 5 (1), 7-9, 1999
Atomic layer epitaxy-a valuable tool for nanotechnology?
M Ritala, M Leskelä
Nanotechnology 10 (1), 19, 1999
Growth of titanium dioxide thin films by atomic layer epitaxy
M Ritala, M Leskelä, E Nykänen, P Soininen, L Niinistö
Thin Solid Films 225 (1-2), 288-295, 1993
Thin Film Deposition Methods for CuInSe 2 Solar Cells
M Kemell, M Ritala, M Leskelä
Critical Reviews in Solid State and Materials Sciences 30 (1), 1-31, 2005
Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films
M Ritala, M Leskela, L Niinisto, P Haussalo
Chemistry of materials 5 (8), 1174-1181, 1993
Molecular tweezers for hydrogen: synthesis, characterization, and reactivity
V Sumerin, F Schulz, M Atsumi, C Wang, M Nieger, M Leskelä, T Repo, ...
Journal of the American Chemical Society 130 (43), 14117-14119, 2008
Facile heterolytic H2 activation by amines and B (C6F5) 3
V Sumerin, F Schulz, M Nieger, M Leskelä, T Repo, B Rieger
Angewandte Chemie International Edition 47 (32), 6001-6003, 2008
Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates
K Kukli, J Ihanus, M Ritala, M Leskela
Applied Physics Letters 68 (26), 3737-3739, 1996
Ruthenium thin films grown by atomic layer deposition
T Aaltonen, P Alen, M Ritala, M Leskelä
Chemical Vapor Deposition 9 (1), 45-49, 2003
Effect of water dose on the atomic layer deposition rate of oxide thin films
R Matero, A Rahtu, M Ritala, M Leskelä, T Sajavaara
Thin Solid Films 368 (1), 1-7, 2000
A frustrated-Lewis-pair approach to catalytic reduction of alkynes to cis-alkenes
K Chernichenko, Á Madarász, I Pápai, M Nieger, M Leskelä, T Repo
Nature chemistry 5 (8), 718-723, 2013
Atomic layer deposition of noble metals and their oxides
J Hämäläinen, M Ritala, M Leskelä
Chemistry of Materials 26 (1), 786-801, 2014
Zirconium dioxide thin films deposited by ALE using zirconium tetrachloride as precursor
M Ritala, M Leskelä
Applied Surface Science 75 (1-4), 333-340, 1994
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