| Immersion Optical Lithography at 193nm BW Smith Future Fab International 15 (4), 2003 | 461 | 2003 |
| Microlithography: Science and Technology JR Sheats, BW Smith Marcel Dekker, 1998 | 460* | 1998 |
| Method of photolithography using a fluid and a system thereof BW Smith US Patent 8,852,850, 2014 | 417 | 2014 |
| Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features BW Smith US Patent 6,881,523, 2005 | 134 | 2005 |
| Microlithography K Suzuki, BW Smith CRC Press, Inc., 2007 | 120* | 2007 |
| Benefiting from polarization effects on high-NA imaging BW Smith, LV Zavyalova, A Estroff Optical Microlithography, 5377, 68-79, 2004 | 90 | 2004 |
| Challenges in high NA, polarization, and photoresists B Smith, J Cashmore Optical Microlithography, 4691, 2002 | 87 | 2002 |
| Development of an inorganic photoresist for DUV, EUV, and electron beam imaging M Trikeriotis, WJ Bae, E Schwartz, M Krysak, N Lafferty, P Xie, B Smith, ... Advances in Resist Materials and Processing Technology XXVII 7639, 76390E, 2010 | 77 | 2010 |
| Water immersion optical lithography for the 45-nm node BW Smith, H Kang, A Bourov, F Cropanese, Y Fan PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 679-689, 2003 | 77 | 2003 |
| Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography M Krysak, M Trikeriotis, E Schwartz, N Lafferty, P Xie, B Smith, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 79721C, 2011 | 75 | 2011 |
| Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography M Krysak, M Trikeriotis, E Schwartz, N Lafferty, P Xie, B Smith, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 79721C, 2011 | 75 | 2011 |
| Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems M Feldman, B Smith, B Rice, T Groves | 72 | 2014 |
| Mask-induced polarization A Estroff, Y Fan, A Bourov, FC Cropanese, NV Lafferty, LV Zavyalova, ... Optical Microlithography, 5377, 1069-1080, 2004 | 65* | 2004 |
| Approaching the numerical aperture of water immersion lithography at 193-nm BW Smith, A Bourov, Y Fan, LV Zavyalova, NV Lafferty, FC Cropanese Optical Microlithography, 5377, 273-284, 2004 | 61 | 2004 |
| 25 nm immersion lithography at 193 nm wavelength BW Smith, Y Fan, M Slocum, L Zavyalova Optical Microlithography XVIII 5754, 141-147, 2005 | 60 | 2005 |
| Method for aberration detection and measurement BW Smith US Patent 7,136,143, 2006 | 56 | 2006 |
| Apparatus and method of image enhancement through spatial filtering B Smith US Patent App. 10/261,591, 2003 | 54 | 2003 |
| Mutual optimization of resolution enhancement techniques BW Smith Journal of Micro/Nanolithography, MEMS and MOEMS 1 (2), 95-105, 2002 | 54* | 2002 |
| Method of photomask correction and its optimization using localized frequency analysis BW Smith US Patent 7,233,887, 2007 | 53 | 2007 |
| Understanding lens aberration and influences to lithographic imaging BW Smith, RE Schlief Optical Microlithography XIII 4000, 294-306, 2000 | 53 | 2000 |
