| Pseudo-resonant full bridge DC/DC converter OD Patterson, DM Divan IEEE Transactions on Power Electronics 6 (4), 671-678, 1991 | 436 | 1991 |
| Semiconductor integrated test structures for electron beam inspection of semiconductor wafers MC Sun, S Jansen, R Mann, OD Patterson US Patent 7,679,083, 2010 | 123 | 2010 |
| Detection of resistive shorts and opens using voltage contrast inspection OD Patterson, H Wildman, D Gal, K Wu The 17th Annual SEMI/IEEE ASMC 2006 Conference, 327-333, 2006 | 116 | 2006 |
| Voltage contrast inspection of deep trench isolation N Arnold, J Liu, BW Messenger, OD Patterson US Patent 8,927,989, 2015 | 104 | 2015 |
| Buried short location determination using voltage contrast inspection OD Patterson, HS Wildman US Patent 7,474,107, 2009 | 103 | 2009 |
| E-beam inspection for detection of sub-design rule physical defects OD Patterson, J Lee, C Lei, D Salvador 2012 SEMI Advanced Semiconductor Manufacturing Conference, 383-387, 2012 | 100 | 2012 |
| Early detection of systematic patterning problems for a 22nm SOI technology using E-beam hot spot inspection OD Patterson, DA Ryan, MD Monkowski, D Nguyen-ngoc, B Morgenfeld, ... ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference, 295-300, 2013 | 99 | 2013 |
| Grounding front-end-of-line structures on a SOI substrate WJ Cote, OD Patterson US Patent 7,518,190, 2009 | 98 | 2009 |
| Early detection of electrical defects in deep trench capacitors using voltage contrast inspection B Donovan, OD Patterson, W Chang, N Arnold, B Messenger, OJ Kwon, ... ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference, 301-306, 2013 | 97 | 2013 |
| Structure and method of mapping signal intensity to surface voltage for integrated circuit inspection OD Patterson, HS Wildman, M Sun US Patent 7,772,866, 2010 | 97 | 2010 |
| Characterization of contact module failure mechanisms for SOI technology using E-beam inspection and in-line TEM XJ Zhou, OD Patterson, W Lee, HH Kang, R Hahn 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 270-276, 2010 | 97 | 2010 |
| Test structure for resistive open detection using voltage contrast inspection and related methods I Ahsan, MB Ketchen, K McStay, OD Patterson US Patent 7,733,109, 2010 | 94 | 2010 |
| Varying capacitance voltage contrast structures to determine defect resistance C Lavoie, CE Murray, OD Patterson, RL Wisnieff US Patent 7,927,895, 2011 | 93 | 2011 |
| Test structures and method of defect detection using voltage contrast inspection OD Patterson, H Zhu US Patent 7,456,636, 2008 | 92 | 2008 |
| Test Structure and e-Beam Inspection Methodology for In-line Detection of (Non-visual) Missing Spacer Defects OD Patterson, K Wu, D Mocuta, K Nafisi 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 48-53, 2007 | 91 | 2007 |
| In-line process window monitoring using voltage contrast inspection OD Patterson, HH Kang, K Wu, P Feichtinger 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 19-24, 2008 | 90 | 2008 |
| Enhancement of voltage contrast inspection signal using scan direction OD Patterson, V Lee, FY Zhao 2007 International Symposium on Semiconductor Manufacturing, 1-4, 2007 | 90 | 2007 |
| Test structure for detection of gap in conductive layer of multilayer gate stack RT Mo, OD Patterson, X Zhou US Patent 8,399,266, 2013 | 87 | 2013 |
| Methodology for trench capacitor etch optimization using voltage contrast inspection and special processing OD Patterson, XJ Zhou, RS Takalkar, KV Hawkins, EH Beckmann, ... 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 109-114, 2010 | 87 | 2010 |
| In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection E Solecky, OD Patterson, A Stamper, E McLellan, R Buengener, A Vaid, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 86 | 2013 |
Xiaohu TangHermes Microvision Inc.Verified email at hermes-microvision.com
