Ali Haider
Başlık
Alıntı yapanlar
Alıntı yapanlar
Yıl
Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors
N Biyikli, A Haider
Semiconductor Science and Technology 32 (9), 093002, 2017
422017
Area-selective atomic layer deposition using an inductively coupled plasma polymerized fluorocarbon layer: a case study for metal oxides
A Haider, P Deminskyi, TM Khan, H Eren, N Biyikli
The Journal of Physical Chemistry C 120 (46), 26393-26401, 2016
282016
Low‐Temperature Deposition of Hexagonal Boron Nitride via Sequential Injection of Triethylboron and N2/H2 Plasma
A Haider, C Ozgit‐Akgun, E Goldenberg, AK Okyay, N Biyikli
Journal of the American Ceramic Society 97 (12), 4052-4059, 2014
282014
Nanoscale selective area atomic layer deposition of TiO 2 using e-beam patterned polymers
A Haider, M Yilmaz, P Deminskyi, H Eren, N Biyikli
RSC advances 6 (108), 106109-106119, 2016
272016
Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si (100)
A Haider, S Kizir, N Biyikli
AIP Advances 6 (4), 045203, 2016
262016
Comparison of trimethylgallium and triethylgallium as “Ga” source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted …
M Alevli, A Haider, S Kizir, SA Leghari, N Biyikli
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34 (1 …, 2016
232016
Atomic layer deposition of ruthenium nanoparticles on electrospun carbon nanofibers: a highly efficient nanocatalyst for the hydrolytic dehydrogenation of methylamine borane
MA Khalily, M Yurderi, A Haider, A Bulut, B Patil, M Zahmakiran, T Uyar
ACS applied materials & interfaces 10 (31), 26162-26169, 2018
222018
Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
A Haider, C Ozgit-Akgun, F Kayaci, AK Okyay, T Uyar, N Biyikli
Apl Materials 2 (9), 096109, 2014
212014
Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
S Kizir, A Haider, N Biyikli
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34 (4 …, 2016
202016
Fabrication of flexible polymer–GaN core–shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
C Ozgit-Akgun, F Kayaci, S Vempati, A Haider, A Celebioglu, ...
Journal of Materials Chemistry C 3 (20), 5199-5206, 2015
192015
Low-temperature grown wurtzite In x Ga 1− x N thin films via hollow cathode plasma-assisted atomic layer deposition
A Haider, S Kizir, C Ozgit-Akgun, E Goldenberg, SA Leghari, AK Okyay, ...
Journal of Materials Chemistry C 3 (37), 9620-9630, 2015
192015
Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
M Alevli, N Gungor, A Haider, S Kizir, SA Leghari, N Biyikli
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34 (1 …, 2016
172016
Enhanced photoresponse of conformal TiO2/Ag nanorod array-based Schottky photodiodes fabricated via successive glancing angle and atomic layer deposition
A Haider, H Cansizoglu, MF Cansizoglu, T Karabacak, AK Okyay, N Biyikli
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 33 (1 …, 2015
162015
Protein-releasing conductive anodized alumina membranes for nerve-interface materials
S Altuntas, F Buyukserin, A Haider, B Altinok, N Biyikli, B Aslim
Materials Science and Engineering: C 67, 590-598, 2016
142016
Effect of O2/Ar flow ratio and post-deposition annealing on the structural, optical and electrical characteristics of SrTiO3 thin films deposited by RF sputtering at room …
E Goldenberg, T Bayrak, C Ozgit-Akgun, A Haider, SA Leghari, M Kumar, ...
Thin Solid Films 590, 193-199, 2015
132015
Self-aligned nanoscale processing solutions via selective atomic layer deposition of oxide, nitride, and metallic films
N Biyikli, A Haider, P Deminskyi, M Yilmaz
Low-Dimensional Materials and Devices 2017 10349, 103490M, 2017
122017
Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
H Altuntas, T Bayrak, S Kizir, A Haider, N Biyikli
Semiconductor Science and Technology 31 (7), 075003, 2016
102016
Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
A Haider, S Kizir, C Ozgit-Akgun, AK Okyay, N Biyikli
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34 (1 …, 2016
72016
Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer deposition
A Haider, P Deminskyi, M Yilmaz, K Elmabruk, I Yilmaz, N Biyikli
Journal of Materials Chemistry C 6 (24), 6471-6482, 2018
62018
Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
P Deminskyi, A Haider, E Kovalska, N Biyikli
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 36 (1 …, 2018
22018
Sistem, işlemi şu anda gerçekleştiremiyor. Daha sonra yeniden deneyin.
Makaleler 1–20