Clifford L. Henderson
Clifford L. Henderson
Chair and Professor, Department of Chemical and Biomedical Engineering, University of South Florida
usf.edu üzerinde doğrulanmış e-posta adresine sahip
Başlık
Alıntı yapanlar
Alıntı yapanlar
Yıl
Influence of molecular weight and film thickness on the glass transition temperature and coefficient of thermal expansion of supported ultrathin polymer films
L Singh, PJ Ludovice, CL Henderson
Thin solid films 449 (1-2), 231-241, 2004
1362004
The mechanism of phenolic polymer dissolution: A new perspective
PC Tsiartas, LW Flanagin, CL Henderson, WD Hinsberg, IC Sanchez, ...
Macromolecules 30 (16), 4656-4664, 1997
1361997
Fabrication of microchannels using polycarbonates as sacrificial materials
HA Reed, CE White, V Rao, SAB Allen, CL Henderson, PA Kohl
Journal of Micromechanics and Microengineering 11 (6), 733, 2001
1242001
Air-channel fabrication for microelectromechanical systems via sacrificial photosensitive polycarbonates
JP Jayachandran, HA Reed, H Zhen, LF Rhodes, CL Henderson, ...
Journal of Microelectromechanical Systems 12 (2), 147-159, 2003
1112003
Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry
A Sinha, DW Hess, CL Henderson
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
1102006
Fabrication of semiconductor device with air gaps for ultra low capacitance interconnections and methods of making same
PA Kohl, SAB Allen, CL Henderson, HA Reed, DM Bhusari
US Patent 6,610,593, 2003
832003
Fabrication of semiconductor device with air gaps for ultra low capacitance interconnections and methods of making same
PA Kohl, SAB Allen, CL Henderson, HA Reed, DM Bhusari
US Patent 6,610,593, 2003
832003
High charge carrier mobility, low band gap donor–acceptor benzothiadiazole-oligothiophene based polymeric semiconductors
B Fu, J Baltazar, Z Hu, AT Chien, S Kumar, CL Henderson, DM Collard, ...
Chemistry of Materials 24 (21), 4123-4133, 2012
802012
Area-selective ALD of titanium dioxide using lithographically defined poly (methyl methacrylate) films
A Sinha, DW Hess, CL Henderson
Journal of the Electrochemical Society 153 (5), G465, 2006
722006
Area-selective ALD of titanium dioxide using lithographically defined poly (methyl methacrylate) films
A Sinha, DW Hess, CL Henderson
Journal of the Electrochemical Society 153 (5), G465, 2006
722006
A correlation study between barrier film performance and shelf lifetime of encapsulated organic solar cells
N Kim, WJ Potscavage Jr, A Sundaramoothi, C Henderson, B Kippelen, ...
Solar energy materials and Solar cells 101, 140-146, 2012
662012
Modeling effects of oxygen inhibition in mask‐based stereolithography
D Bourell, B Stucker, AS Jariwala, F Ding, A Boddapati, V Breedveld, ...
Rapid Prototyping Journal, 2011
642011
Sacrificial compositions and methods of fabricating a structure using sacrificial compositions
PA Kohl, PJ Joseph, HK Reed, SA Bidstrup-Allen, CE White, ...
US Patent 7,695,894, 2010
622010
Creating Graphene p–n junctions using self-assembled monolayers
H Sojoudi, J Baltazar, LM Tolbert, CL Henderson, S Graham
ACS applied materials & interfaces 4 (9), 4781-4786, 2012
602012
Patterning of sacrificial materials
W King, C Henderson, H Rowland, C White
US Patent App. 10/990,940, 2005
602005
Engineering substructure morphology of asymmetric carbon molecular sieve hollow fiber membranes
N Bhuwania, Y Labreche, CSK Achoundong, J Baltazar, SK Burgess, ...
Carbon 76, 417-434, 2014
572014
Production of heavily n-and p-doped CVD graphene with solution-processed redox-active metal–organic species
SA Paniagua, J Baltazar, H Sojoudi, SK Mohapatra, S Zhang, ...
Materials Horizons 1 (1), 111-115, 2014
572014
Impact of post-growth thermal annealing and environmental exposure on the unintentional doping of CVD graphene films
H Sojoudi, J Baltazar, C Henderson, S Graham
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2012
542012
Fabrication of semiconductor devices with air gaps for ultra low capacitance interconnections and methods of making same
PA Kohl, SAB Allen, CL Henderson, HA Reed, DM Bhusari
US Patent 6,888,249, 2005
472005
Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition
A Sinha, DW Hess, CL Henderson
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
462007
Sistem, işlemi şu anda gerçekleştiremiyor. Daha sonra yeniden deneyin.
Makaleler 1–20