Takip et
Kyuhee Han
Kyuhee Han
Samsung Electronics, Seoul National University
samsung.com üzerinde doğrulanmış e-posta adresine sahip
Başlık
Alıntı yapanlar
Alıntı yapanlar
Yıl
Gas supplying apparatus
K Han, SW Yoo, S Lee
US Patent 7,303,141, 2007
3952007
A study of pin-to-plate type spark discharge generator for producing unagglomerated nanoaerosols
K Han, W Kim, J Yu, J Lee, H Lee, CG Woo, M Choi
Journal of Aerosol Science 52, 80-88, 2012
642012
High‐resolution, parallel patterning of nanoparticles via an ion‐induced focusing mask
S You, K Han, H Kim, H Lee, CG Woo, C Jeong, W Nam, M Choi
Small 6 (19), 2146-2152, 2010
492010
Controlled positioning of metal nanoparticles in an organic light-emitting device for enhanced quantum efficiency
H Sung, J Lee, K Han, JK Lee, J Sung, D Kim, M Choi, C Kim
Organic Electronics 15 (2), 491-499, 2014
462014
Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes
V Volynets, Y Barsukov, G Kim, JE Jung, SK Nam, K Han, S Huang, ...
Journal of Vacuum Science & Technology A 38 (2), 2020
242020
Role of NO in highly selective SiN/SiO2 and SiN/Si etching with NF3/O2 remote plasma: Experiment and simulation
Y Barsukov, V Volynets, S Lee, G Kim, B Lee, SK Nam, K Han
Journal of Vacuum Science & Technology A 35 (6), 2017
202017
Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism
JE Jung, Y Barsukov, V Volynets, G Kim, SK Nam, K Han, S Huang, ...
Journal of Vacuum Science & Technology A 38 (2), 2020
182020
Large-area assembly of three-dimensional nanoparticle structures via ion assisted aerosol lithography with a multi-pin spark discharge generator
K Ha, H Choi, K Jung, K Han, JK Lee, KJ Ahn, M Choi
Nanotechnology 25 (22), 225302, 2014
182014
Highly selective Si3N4/SiO2 etching using an NF3
V Volynets, Y Barsukov, G Kim, JE Jung, SK Nam, K Han, S Huang, ...
N2, 2020
132020
Plasma processing system, electron beam generator, and method of fabricating semiconductor device
Y Lee, S Kang, SK Nam, HEO Kwangyoub, K Han
US Patent 10,347,468, 2019
112019
Gas injection apparatus and thin film deposition equipment including the same
K Kim, JI Ahn, JH Seo, JC Lee, K Han, SH Lee, JP Heo
US Patent 10,041,172, 2018
102018
Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same
D Shin, NAM Sangki, S Park, A Koshiishi, K Han
US Patent 11,195,696, 2021
42021
Cleaning solution production systems and methods, and plasma reaction tanks
BJ Yoo, MH Kim, SK Nam, WH Jang, KH Han, Y Do Kim, JM Bang
US Patent 11,107,705, 2021
32021
Substrate cleaning method, substrate cleaning apparatus, and method for fabricating a semiconductor device using the apparatus
YOO Beomjin, KIM Minhyoung, J Wonhyuk, H Choi, B Jeongmin, K Han
US Patent 10,998,185, 2021
32021
Method of manufacturing integrated circuit device
J Park, SK Nam, K Han, J Kim, JH Park, G Yoo
US Patent 10,795,262, 2020
32020
Gas injection apparatus and thin film deposition equipment including the same
K Kim, JI Ahn, JH Seo, JC Lee, K Han, SH Lee, JP Heo
US Patent 10,669,631, 2020
32020
Controlled enhancement in hole injection at gold-nanoparticle-on-organic electrical contacts fabricated by spark-discharge aerosol technique
J Lee, H Kim, K Han, Y Lee, M Choi, C Kim
ACS applied materials & interfaces 11 (6), 6276-6282, 2019
32019
Plasma processing system, electron beam generator, and method of fabricating semiconductor device
Y Lee, S Kang, SK Nam, HEO Kwangyoub, K Han
US Patent 10,522,332, 2019
22019
Method of forming a semiconductor device with an injector having first and second outlets
N Cho, Y Kim, P Keesoo, ES Choi, K Han
US Patent 10,381,461, 2019
22019
Process for preparing nanoparticle embedded electronic device
C Kim, KIM Hyungchae, J Lee, K Han, H Sung, K Jung, H Choi, K Ha, ...
US Patent 9,349,976, 2016
12016
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