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Martha Sanchez
Martha Sanchez
IBM
Verified email at pacbell.net
Title
Cited by
Cited by
Year
Liquid immersion deep-ultraviolet interferometric lithography
JA Hoffnagle, WD Hinsberg, M Sanchez, FA Houle
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999
6871999
Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance
W Hinsberg, FA Houle, J Hoffnagle, M Sanchez, G Wallraff, M Morrison, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998
2181998
Modeling line edge roughness effects in sub 100 nanometer gate length devices
P Oldiges, Q Lin, K Petrillo, M Sanchez, M Ieong, M Hargrove
2000 International Conference on Simulation Semiconductor Processes and …, 2000
2012000
Nanoporous polyimides derived from highly fluorinated polyimide/poly (propylene oxide) copolymers
KR Carter, RA DiPietro, MI Sanchez, SA Swanson
Chemistry of materials 13 (1), 213-221, 2000
1802000
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
WD Hinsberg, FA Houle, MI Sanchez, GM Wallraff
IBM Journal of Research and Development 45 (5), 667-682, 2001
1742001
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
FA Houle, WD Hinsberg, M Morrison, MI Sanchez, G Wallraff, C Larson, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
1582000
Polyimides derived from nonaromatic monomers: Synthesis, characterization and potential applications
W Volksen, HJ Cha, MI Sanchez, DY Yoon
Reactive and Functional Polymers 30 (1-3), 61-69, 1996
1231996
Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns
CV Nguyen, RMD Stevens, J Barber, J Han, M Meyyappan, MI Sanchez, ...
Applied Physics Letters 81 (5), 901-903, 2002
972002
Aerial image contrast using interferometric lithography: effect on line-edge roughness
MI Sanchez, WD Hinsberg, FA Houle, JA Hoffnagle, H Ito, CV Nguyen
Advances in Resist Technology and Processing XVI 3678, 160-171, 1999
941999
Effect of resist components on image spreading during postexposure bake of chemically amplified resists
WD Hinsberg, FA Houle, MI Sanchez, ME Morrison, GM Wallraff, ...
Advances in Resist Technology and Processing XVII 3999, 148-160, 2000
922000
Extendibility of chemically amplified resists: another brick wall?
WD Hinsberg, FA Houle, MI Sanchez, JA Hoffnagle, GM Wallraff, ...
Advances in Resist Technology and Processing XX 5039, 1-14, 2003
912003
Fast model-based optical proximity correction
AE Rosenbluth, GM Gallatin, RL Gordon, N Seong, AY Lvov, ...
US Patent 7,079,223, 2006
902006
High-temperature polyimide nanofoams for microelectronic applications
JL Hedrick, KR Carter, HJ Cha, CJ Hawker, RA DiPietro, JW Labadie, ...
Reactive and Functional polymers 30 (1-3), 43-53, 1996
881996
Liquid immersion lithography: evaluation of resist issues
W Hinsberg, GM Wallraff, CE Larson, BW Davis, V Deline, S Raoux, ...
Advances in Resist Technology and Processing XXI 5376, 21-33, 2004
802004
Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
FA Houle, WD Hinsberg, MI Sanchez, JA Hoffnagle
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
752002
Kinetic model for positive tone resist dissolution and roughening
FA Houle, WD Hinsberg, MI Sanchez
Macromolecules 35 (22), 8591-8600, 2002
712002
Polyimide nanofoams based on ordered polyimides derived from poly (amic alkyl esters): PMDA/4-BDAF
KR Carter, RA DiPietro, MI Sanchez, TP Russell, P Lakshmanan, ...
Chemistry of materials 9 (1), 105-118, 1997
711997
High-NA lithographic imagery at Brewster's angle
TA Brunner, N Seong, WD Hinsberg, JA Hoffnagle, FA Houle, MI Sanchez
Optical Microlithography XV 4691, 1-10, 2002
672002
Method of measuring the spatial resolution of a photoresist
JA Hoffnagle, WD Hinsberg, MI Sanchez, FA Houle
Optics letters 27 (20), 1776-1778, 2002
512002
Polyimide nanofoams from caprolactone-based copolymers
JL Hedrick, TP Russell, M Sanchez, R DiPietro, S Swanson, ...
Macromolecules 29 (10), 3642-3646, 1996
511996
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