| Experimental observation on the Fermi level shift in polycrystalline Al-doped ZnO films J Jia, A Takasaki, N Oka, Y Shigesato Journal of Applied Physics 112 (1), 2012 | 111 | 2012 |
| Temperature dependence of thermal conductivity of VO2 thin films across metal–insulator transition H Kizuka, T Yagi, J Jia, Y Yamashita, S Nakamura, N Taketoshi, ... Japanese journal of applied physics 54 (5), 053201, 2015 | 81 | 2015 |
| Thermal conductivity of amorphous indium–gallium–zinc oxide thin films T Yoshikawa, T Yagi, N Oka, J Jia, Y Yamashita, K Hattori, Y Seino, ... Applied Physics Express 6 (2), 021101, 2013 | 71 | 2013 |
| On the Crystal Structural Control of Sputtered TiO2 Thin Films J Jia, H Yamamoto, T Okajima, Y Shigesato Nanoscale research letters 11, 1-9, 2016 | 53 | 2016 |
| Influence of dopant species and concentration on grain boundary scattering in degenerately doped In2O3 thin films MV Frischbier, HF Wardenga, M Weidner, O Bierwagen, J Jia, ... Thin Solid Films 614, 62-68, 2016 | 53 | 2016 |
| In situ analyses on negative ions in the indium-gallium-zinc oxide sputtering process J Jia, Y Torigoshi, Y Shigesato Applied Physics Letters 103 (1), 2013 | 41 | 2013 |
| Thermal conductivity of hetero-epitaxial ZnO thin films on c-and r-plane sapphire substrates: Thickness and grain size effect Y Yamashita, K Honda, T Yagi, J Jia, N Taketoshi, Y Shigesato Journal of Applied Physics 125 (3), 2019 | 40 | 2019 |
| Origin of carrier scattering in polycrystalline Al-doped ZnO films J Jia, N Oka, M Kusayanagi, S Nakatomi, Y Shigesato Applied Physics Express 7 (10), 105802, 2014 | 36 | 2014 |
| Evolution of defect structures and deep subgap states during annealing of amorphous in-ga-zn oxide for thin-film transistors Junjun Jia, Ayaka Suko, Yuzo Shigesato, Toshihiro Okajima, Keiko Inoue ... Physical Review Applied 9, 014018, 2018 | 32 | 2018 |
| Transparent conductive Nb-doped TiO2 films deposited by reactive dc sputtering using Ti–Nb alloy target, precisely controlled in the transition region using impedance feedback … N Oka, Y Sanno, J Jia, S Nakamura, Y Shigesato Applied surface science 301, 551-556, 2014 | 32 | 2014 |
| A visible-light active TiO 2 photocatalyst multilayered with WO 3 J Jia, K Taniyama, M Imura, T Kanai, Y Shigesato Physical Chemistry Chemical Physics 19 (26), 17342-17348, 2017 | 29 | 2017 |
| Work function tuning of tin-doped indium oxide electrodes with solution-processed lithium fluoride CW Ow-Yang, J Jia, T Aytun, M Zamboni, A Turak, K Saritas, Y Shigesato Thin Solid Films 559, 58-63, 2014 | 28 | 2014 |
| Visible-light active thin-film WO3 photocatalyst with controlled high-rate deposition by low-damage reactive-gas-flow sputtering N Oka, A Murata, S Nakamura, J Jia, Y Iwabuchi, H Kotsubo, Y Shigesato APL Materials 3 (10), 2015 | 27 | 2015 |
| Amorphous indium-tin-zinc oxide films deposited by magnetron sputtering with various reactive gases: Spatial distribution of thin film transistor performance J Jia, Y Torigoshi, E Kawashima, F Utsuno, K Yano, Y Shigesato Applied Physics Letters 106 (2), 2015 | 27 | 2015 |
| Crystallization behavior of amorphous indium–gallium–zinc-oxide films and its effects on thin-film transistor performance A Suko, JJ Jia, S Nakamura, E Kawashima, F Utsuno, K Yano, ... Japanese journal of applied physics 55 (3), 035504, 2016 | 26 | 2016 |
| Al-doped ZnO films deposited on a slightly reduced buffer layer by reactive dc unbalanced magnetron sputtering M Kusayanagi, A Uchida, N Oka, J Jia, S Nakamura, Y Shigesato Thin Solid Films 555, 93-99, 2014 | 26 | 2014 |
| Transparent conductive Al and Ga doped ZnO films deposited using off-axis sputtering J Jia, A Yoshimura, Y Kagoya, N Oka, Y Shigesato Thin solid films 559, 69-77, 2014 | 23 | 2014 |
| Direct observation of the band gap shrinkage in amorphous In2O3–ZnO thin films J Jia, N Oka, Y Shigesato Journal of Applied Physics 113 (16), 2013 | 23 | 2013 |
| Comparative study of sputter‐deposited SnO2 films doped with antimony or tantalum M Weidner, J Jia, Y Shigesato, A Klein physica status solidi (b) 253 (5), 923-928, 2016 | 22 | 2016 |
| p-type conduction mechanism in continuously varied non-stoichimetric SnOx thin films deposited by reactive sputtering with the impedance control J Jia, T Sugane, S Nakamura, Y Shigesato Journal of Applied Physics 127 (18), 2020 | 18 | 2020 |
